Ion and Plasma Sources

 

 

 

    

                                                              

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Ion and Plasma Sources

 

 

 

    

                                                              

Bühler Leybold Optics ion and plasma sources are designed to fit your machines and process technologies. They are developed as an assist source to control the properties during layer deposition, as a main source for sputter deposition (IBS) or as an etching source for material removal or substrate polishing.

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Our advantages

Variability

Our portfolio of ion and plasma sources enables us to serve a broad range of applications.

Innovation

Our ion and plasma sources are continuously developed and maintained to ensure their cutting-edge technology.

Support

With decades of experience in source technology, we support you with your process needs.

Our Sources

Gridless DC-discharge plasma source - APSpro

The APSpro source provides ion energies up to 200 eV and is used as assist source in evaporation coaters for precision optics.

Single grid RF ion source - LION

Source with ion energies up to 1000 eV, used as an assist source in evaporation coaters for precision optics.

Three grid RF ion source - RF40 and RF80

RF source with ion energies up to 1500 eV, used as a sputter source in our ion beam figuring (IBF) and ion beam trimming (IBT) machines or as an assist source in optical coaters.


Contact us

Alzenau, Germany

leyboldoptics@buhlergroup.com

+49 6023 500 0 
Siemensstrasse 88
63755 Alzenau, Germany

 

Leipzig, Germany

info.leipzig@buhlergroup.com

+49 341 234935 0 
Wollkämmereistrasse 2
04357 Leipzig, Germany